An improved press for lithographic printing has been invented by H. C. Spaulding, of Hartford, Ct. The object accomplished by the improvement consists in giving a uniform and forcible impression ...

according to a press release by LLNL. The project also aims to investigate the primary hypothesis that the energy efficiency of existing EUV lithography sources for semiconductor production can be ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

By using SAQP with deep ultraviolet lithography (DUV ... Amid this atmosphere, Huawei last week skipped its traditional press conference usually held after announcing annual results, over fears ...

Nanoimprint lithography (NIL) is re-emerging amid an explosion of new applications in the market. Canon, EV Group, Nanonex, Suss and others continue to develop and ship NIL systems for a range of ...

Directed self-assembly (DSA) is moving back onto the patterning radar screen amid ongoing challenges in lithography. Intel continues to have a keen interest in DSA, while other chipmakers are taking ...

The most advanced lithography machines are the final missing... Save my User ID and Password Some subscribers prefer to save their log-in information so they do not have to enter their User ID and ...